Statistical Process Analysis & Control Environment.

  • Deployed in Fab2 for all SPC (tool and lot) in 2016.
  • Capability to make overall charts for an operation, tool
  • Specific charts or product specific charts.
  • Capability to make trends based on relevant process steps
  • Capability to automatically detect violations based on WER rules preventing further processing

APC (Advanced Process Control)

Installed in Litho (2018-2019)
Principle: based on Cd and alignment measurements on lots, calculated exposure dose offsets and registration offsets get fed forward to stepper to tune next lot(s) to target. Using CamLine-SPACE software.